Sannomiya, Takumi, Dr.

Current Research

• Experiment and Simulation of Plasmonic Structures for Biosensing Application

Research Interests

• Plasmonic materials
• Optical biosensors
• Electromagnetic simulation
• Scanning / Transmission electron microscopy (STEM/TEM)
• Aberration correctors (Cs correctors) for STEM/TEM
• Magnetic thin films and domain structures

Publication

• “In situ Sensing of Single Binding Events by Localized Surface Plasmon Resonance”
  T. Sannomiya, Ch. Hafner, J. Voros
  Nano Letters, Volume 8, No.10, 2008, pp. 3450–3455

• “Measurement method of aberration from Ronchigram by autocorrelation function”
  H. Sawada, T. Sannomiya, F. Hosokawa, T. Nakamichi, T. Kaneyama, T. Tomita, Y. Kondo, T. Tanaka, Y. Oshima, Y. Tanishiro, K. Takayanagi
  Ultramicroscopy, Volume 108, 2008, pp. 1467–1475

• “Achieving 63pm Resolution in Scanning Transmission Electron Microscope with Spherical Aberration Corrector”
  H. Sawada, F. Hosokawa, T. Kaneyama, T. Ishizawa, M. Terao, M. Kawazoe, T. Sannomiya, T. Tomita, Y. Kondo, T. Tanaka, Y. Oshima, Y. Tanishiro, N. Yamamoto, K. Takayanagi
  Japanese Journal of Applied Physics, Volume 46, No 23, 2007, pp. L568–L570

• “Ultrahigh-Vacuum Third-Order Spherical Aberration (Cs) Corrector for a Scanning Transmission Electron Microscope”
  K. Mitsuishi,1, M. Takeguchi, Y. Kondo, F. Hosokawa, K. Okamoto, T. Sannomiya, M. Hori, T. Iwama, M. Kawazoe, K. Furuya
  Microscopy and Microanalysis, Volume 12, Issue 6, 2006, pp.456-460

• “Correlation between magnetization performance and magnetic microstructure of patterned permalloy films fabricated by microcontact printing”
  T. Sannomiya, J. Shi, Y. Nakamura, O. Nittono.
  Journal of Applied Physics, Volume 96, Issue 9, 2004, pp. 5050-5055

• “Observation of magnetic structures in Fe granular films by differential phase contrast scanning transmission electron microscopy”
  T. Sannomiya, Y. Haga, Y. Nakamura, O. Nittono, Y. Takahashi.
  Journal of Applied Physics, Volume 95, Issue 1, 2004, pp. 214-218
  etc

Patent

• “Transmission Electron Microscope”
  T. Sannomiya, Y. Kondo
  United States Patent #US20080011949 (2008)
• “Method of measuring aberrations and correcting aberrations using ronchigram and electron microscope”
  H. Sawada, T. Sannomiya
  United States Patent #US20070120055 (2007)